A bench-top, stand-alone nanoimprint platform: The PL series PL200/400/600.

This platform provides a mechanical stage with micro-positioning fixtures for mounting a nanoimprint chamber, UV-curing source, and alignment microscope.

It functions both as a nanoimprint system and as a traditional mask aligner while providing programmable, automatic control of your entire imprinting process.

Advantages

-Sub-10nm resolution with 99% yield

-Supports both hard and soft molds

-Variable mold and substrate sizes offer unparalleled convenience and flexibility

-Auto-Release process prevents mold/substrate damage during separation and maximizes yiel-d per imprint

-Auto-Release process prevents mold/substrate damage during separation and maximizes yield per imprint

-Versatile processes for a wide variety of applications:

-optical devices, displays, data storage, biomedical

-devices, semiconductor IC's, chemical synthesis, and advanced materials

-Programmable PLC with touch-screen user interface allows process control through customized parameters

-Proprietary UV-curable nanoimprint resist has no limitations on hardness or thickness, and is compatible with traditional photolithography processes